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SINO Plasma7000Metal metal etcher
The SINO Plasma7000Metal is a metal etcher. It selectively removes metal layers on semiconductor wafers, leveraging plasma - based reactions. It ensures high - precision etching, minimizing damage to underlying layers, which is vital for fabricating complex metal - based semiconductor structures.
Process application
Etching of aluminum, titanium, molybdenum, tungsten, titanium oxide, titanium nitride, aluminum nitride, etc
Wafer size
8 inches and below
Applicable substrate material
Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
Application area
Scientific research, Si based process, compounds (including GaN&GaAs&SiC, etc.), MEMS field, filter, optical communication, micro display and other fields.
Etching of aluminum, titanium, molybdenum, tungsten, titanium oxide, titanium nitride, aluminum nitride, etc
Wafer size
8 inches and below
Applicable substrate material
Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
Application area
Scientific research, Si based process, compounds (including GaN&GaAs&SiC, etc.), MEMS field, filter, optical communication, micro display and other fields.
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