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SINO Plasma2000ICP ICP etcher
The SINO Plasma2000ICP is an ICP etcher. It generates high - density plasma through inductively coupled coils. It etches materials such as Si, SiO₂, and Si₃N₄ with high accuracy, offering fast etching rates and excellent control over the etching process, essential for semiconductor device manufacturing.
Process application
Silicon etching, polycrystalline silicon etching, silicon nitride etching, silicon oxide etching, silicon carbide etching, gallium nitride etching, gallium arsenide etching, aluminum nitride etching, optical waveguide etching
Wafer size
8 inches and below
Applicable substrate material
Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
Application area
Scientific research, Si based process, compounds (including GaN&GaAs&SiC&AlN, etc.), MEMS field, filter, optical communication, micro display, optical micro processing, etc.
Silicon etching, polycrystalline silicon etching, silicon nitride etching, silicon oxide etching, silicon carbide etching, gallium nitride etching, gallium arsenide etching, aluminum nitride etching, optical waveguide etching
Wafer size
8 inches and below
Applicable substrate material
Silicon, silicon carbide, gallium nitride, gallium arsenide, sapphire, quartz glass
Application area
Scientific research, Si based process, compounds (including GaN&GaAs&SiC&AlN, etc.), MEMS field, filter, optical communication, micro display, optical micro processing, etc.
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